Title:
PROCESS FOR PRODUCTION OF FLUOROPOLYMERS FOR RESIST
Document Type and Number:
WIPO Patent Application WO/2004/024787
Kind Code:
A1
Abstract:
A process for the production of fluoropolymers for resist which are excellent in transparency in the vacuum ultraviolet region and useful as photoresists (particularly F2 resist) capable of forming ultrafine patterns and which each comprise repeating units (M1) resulting from a fluorinated ethylenic monomer (m1) having two or three carbon atoms and at least one fluorine atom and/or repeating units (M2) resulting from an optionally fluorinated monomer (m2) capable of giving an alicyclic structure to the backbone chain of the polymer and have in the polymer acid-reactive groups (Y1) or groups (Y2) convertible into acid-reactive groups (Y1), characterized in that the monomer (m1) and/or the monomer (m2) is radical-polymerized by the use of a fluorine-containing polymerization initiator.
Inventors:
ARAKI TAKAYUKI (JP)
ISHIKAWA TAKUJI (JP)
KOH MEITEN (JP)
TORIUMI MINORU (JP)
YAMAZAKI TAMIO (JP)
FURUKAWA TAKAMITSU (JP)
ITANI TOSHIRO (JP)
ISHIKAWA TAKUJI (JP)
KOH MEITEN (JP)
TORIUMI MINORU (JP)
YAMAZAKI TAMIO (JP)
FURUKAWA TAKAMITSU (JP)
ITANI TOSHIRO (JP)
Application Number:
PCT/JP2003/011605
Publication Date:
March 25, 2004
Filing Date:
September 11, 2003
Export Citation:
Assignee:
DAIKIN IND LTD (JP)
SEMICONDUCTOR LEADING EDGE TEC (JP)
ARAKI TAKAYUKI (JP)
ISHIKAWA TAKUJI (JP)
KOH MEITEN (JP)
TORIUMI MINORU (JP)
YAMAZAKI TAMIO (JP)
FURUKAWA TAKAMITSU (JP)
ITANI TOSHIRO (JP)
SEMICONDUCTOR LEADING EDGE TEC (JP)
ARAKI TAKAYUKI (JP)
ISHIKAWA TAKUJI (JP)
KOH MEITEN (JP)
TORIUMI MINORU (JP)
YAMAZAKI TAMIO (JP)
FURUKAWA TAKAMITSU (JP)
ITANI TOSHIRO (JP)
International Classes:
C08F214/18; (IPC1-7): C08F214/18
Domestic Patent References:
| WO2001074916A1 | 2001-10-11 |
Foreign References:
| JP2003255540A | 2003-09-10 | |||
| JPS62223210A | 1987-10-01 |
Attorney, Agent or Firm:
Asahina, Sohta (2-22 Tanimachi 2-chome, Chuo-k, Osaka-shi Osaka, JP)
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