Title:
PROCESS FOR PRODUCTION OF LIQUID CRYSTAL POLYESTER FILM, AND LIQUID CRYSTAL POLYESTER FILM
Document Type and Number:
WIPO Patent Application WO/2011/033986
Kind Code:
A1
Abstract:
A liquid crystal polyester film having improved light permeability can be produced. A liquid composition comprising a liquid crystal polyester and a solvent is casted on a base material, and the resulting product is dried, thereby preparing a liquid crystal polyester precursor film that still contains the solvent. The liquid crystal polyester precursor film is heat-treated by raising the temperature to prepare a liquid crystal polyester film. In the heat treatment of the liquid crystal polyester precursor film, the temperature-raising rate is set at 5˚C/min or less, and the highest temperature of the heat-treatment of the liquid crystal polyester precursor film is set at 300°C or lower. In this manner, a liquid crystal polyester film having gas barrier properties and excellent light permeability can be produced.
Inventors:
IYAMA Hironobu (3-7-21-131, Kasuga Tsukuba-sh, Ibaraki 21, 〒3050821, JP)
井山 浩暢 (〒21 茨城県つくば市春日3-7-21-131 Ibaraki, 〒3050821, JP)
ITO Toyonari (3-8-3-405, Azuma Tsukuba-sh, Ibaraki 31, 〒3050031, JP)
井山 浩暢 (〒21 茨城県つくば市春日3-7-21-131 Ibaraki, 〒3050821, JP)
ITO Toyonari (3-8-3-405, Azuma Tsukuba-sh, Ibaraki 31, 〒3050031, JP)
Application Number:
JP2010/065529
Publication Date:
March 24, 2011
Filing Date:
September 09, 2010
Export Citation:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED (27-1, Shinkawa 2-chome Chuo-k, Tokyo 60, 〒1048260, JP)
住友化学株式会社 (〒60 東京都中央区新川二丁目27番1号 Tokyo, 〒1048260, JP)
IYAMA Hironobu (3-7-21-131, Kasuga Tsukuba-sh, Ibaraki 21, 〒3050821, JP)
井山 浩暢 (〒21 茨城県つくば市春日3-7-21-131 Ibaraki, 〒3050821, JP)
住友化学株式会社 (〒60 東京都中央区新川二丁目27番1号 Tokyo, 〒1048260, JP)
IYAMA Hironobu (3-7-21-131, Kasuga Tsukuba-sh, Ibaraki 21, 〒3050821, JP)
井山 浩暢 (〒21 茨城県つくば市春日3-7-21-131 Ibaraki, 〒3050821, JP)
International Classes:
B29C41/12; B29C41/46; C08G63/02; C08J5/18; C08K5/00; C08L67/00; B29K67/00; B29L7/00
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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