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Title:
PROCESS FOR PRODUCTION OF ORGANOPOLYSILOXANE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2011/074585
Kind Code:
A1
Abstract:
Disclosed is a process for producing an organopolysiloxane compound in which a poly(N-acylalkylene imine) segment composed of a repeating unit represented by general formula (1) is bound to a terminal and/or a side chain of an organopolysiloxane segment. The process comprises the steps of: (a) carrying out a ring-opening polymerization reaction in a cyclic imino ether compound solution that is prepared by mixing a cyclic imino ether compound represented by general formula (I) with a solvent to prepare a terminal-reactive poly(N-acylalkylene imine) solution; (b) dehydrating and drying a modified organopolysiloxane solution that is prepared by mixing a modified organopolysiloxane having an amino group at a terminal of a molecule chain thereof and/or in a side chain thereof with a solvent, so that the water content in a mixed solution prepared by mixing the terminal-reactive poly(N-acylalkylene imine) solution produced in step (a) with the modified organopolysiloxane solution becomes 150 mg/kg or less; and (c) mixing the modified organopolysiloxane solution produced in step (b) with the terminal-reactive poly(N-acylalkylene imine) solution produced in step (a) to cause the reaction between these solutions. (In the formula, R1 represents a hydrogen atom, or an alkyl, aralkyl or aryl group having 1 to 22 carbon atoms; and n represents 2 or 3.)

Inventors:
KODATE TAKASHI (JP)
RINDO KATSUHIKO (JP)
TAKIGUCHI OSAMU (JP)
Application Number:
PCT/JP2010/072501
Publication Date:
June 23, 2011
Filing Date:
December 14, 2010
Export Citation:
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Assignee:
KAO CORP (JP)
KODATE TAKASHI (JP)
RINDO KATSUHIKO (JP)
TAKIGUCHI OSAMU (JP)
International Classes:
C08G81/00; C08G77/452
Domestic Patent References:
WO2009014237A22009-01-29
Foreign References:
JP2009256367A2009-11-05
JPH10306163A1998-11-17
Other References:
See also references of EP 2514784A4
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (JP)
Tamotsu Otani (JP)
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