Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PROCESS FOR PRODUCTION OF POLYGLYCOLIC ACID RESIN MOLDING HAVING FINE RUGGED PATTERN ON THE SURFACE
Document Type and Number:
WIPO Patent Application WO/2010/137565
Kind Code:
A1
Abstract:
A process for the production of a polyglycolic acid resin molding having a fine rugged pattern, which comprises: a step of disposing a mold (A) having a smooth surface and a mold (B) having an uneven surface provided with a fine rugged pattern in a manner such that the smooth surface of the mold (A) and the uneven surface of the mold (B) face each other; a step of heating a polyglycolic acid resin to 200-300°C, and thereby melting the resin; a step of heating the molds (A) and (B) to a temperature of Tc+0(°C) to Tc+80(°C) (wherein Tc is the crystallization temperature of the polyglycolic acid resin); a step of interposing the molten polyglycolic acid resin between the heated molds (A) and (B), and forming a resin layer therebetween; a step of applying a pressure of 1 to 18MPa between the molds (A) and (B), and thereby transferring the fine rugged pattern of the mold (B) to the resin layer; and a step of cooling, during the period after the initiation of cooling of the mold (B) until the point of time at which the temperature of the mold (A) lowers to Tc-40 (°C), the molds (A) and (B) in a manner that keeps the temperature of the mold (A) higher than that of the mold (B), and thereby cooling and solidifying the resin layer to which the fine rugged pattern has been transferred.

Inventors:
AKUTSU FUMIO (JP)
Application Number:
PCT/JP2010/058764
Publication Date:
December 02, 2010
Filing Date:
May 24, 2010
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KUREHA CORP (JP)
AKUTSU FUMIO (JP)
International Classes:
B29C59/02; B29K1/00
Foreign References:
JP2008265001A2008-11-06
JP2007181961A2007-07-19
JP2008054566A2008-03-13
JP2009072271A2009-04-09
JP2008062486A2008-03-21
JP2008114482A2008-05-22
Attorney, Agent or Firm:
CENTCREST IP ATTORNEYS (JP)
Patent business corporation cent Crest international patent firm (JP)
Download PDF: