Title:
PROCESS FOR PURIFYING OCTAFLUOROCYCLOBUTANE, PROCESS FOR PREPARING THE SAME, AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO2002055458
Kind Code:
A3
Abstract:
A process for purifying octafluorocyclobutane according to the present invention is characterized by contacting a crude octafluorocyclobutane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluorocyclobutane. According to the purification process or preparation process of octafluorocyclobutane of the present invention, the impurities such as fluorocarbon can be substantially removed and a high-purity octafluorocyclobutane can be easily obtained. The octafluorocyclobutane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device or the like.
Inventors:
HORIBA MINAKO (JP)
SUZUKI YASUHIRO (JP)
SUZUKI YASUHIRO (JP)
Application Number:
PCT/JP2002/000148
Publication Date:
February 20, 2003
Filing Date:
January 11, 2002
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
HORIBA MINAKO (JP)
SUZUKI YASUHIRO (JP)
HORIBA MINAKO (JP)
SUZUKI YASUHIRO (JP)
International Classes:
C07C17/269; C07C17/389; C07C17/395; C07C23/06; H01L21/3065; (IPC1-7): C07C17/395; C07C17/389; C07C17/269; C07C23/06; H01L21/3065; C11D7/50
Foreign References:
US3696156A | 1972-10-03 | |||
EP0370688A1 | 1990-05-30 | |||
US2384821A | 1945-09-18 | |||
US2384449A | 1945-09-11 |
Other References:
See also references of EP 1307416A2
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