Title:
PROCESSES AND APPARATUSES FOR TREATING HALOGEN-CONTAINING GASES
Document Type and Number:
WIPO Patent Application WO2004063313
Kind Code:
A3
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.
Inventors:
JOSEPHSON GARY B (US)
LESSOR DELBERT L (US)
RAPPE KENNETH G (US)
ORTH RICK J (US)
AARDAHL CHRISTOPHER L (US)
LESSOR DELBERT L (US)
RAPPE KENNETH G (US)
ORTH RICK J (US)
AARDAHL CHRISTOPHER L (US)
Application Number:
PCT/US2004/000688
Publication Date:
September 02, 2004
Filing Date:
January 12, 2004
Export Citation:
Assignee:
BATTELLE MEMORIAL INSTITUTE (US)
JOSEPHSON GARY B (US)
LESSOR DELBERT L (US)
RAPPE KENNETH G (US)
ORTH RICK J (US)
AARDAHL CHRISTOPHER L (US)
JOSEPHSON GARY B (US)
LESSOR DELBERT L (US)
RAPPE KENNETH G (US)
ORTH RICK J (US)
AARDAHL CHRISTOPHER L (US)
International Classes:
B01D53/32; B01D53/68; B01D53/70; B01D53/79; C10L; (IPC1-7): B01D53/32; B01D53/68
Domestic Patent References:
| WO2001012300A1 | 2001-02-22 |
Foreign References:
| US5187344A | 1993-02-16 | |||
| US5560844A | 1996-10-01 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 06 30 April 1998 (1998-04-30)
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