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Patent Searching and Data


Title:
PROCESSING APPARATUS, SPRAY PROCESSING METHOD, AND METHOD FOR MANUFACTURING ELECTRODE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2014/119735
Kind Code:
A1
Abstract:
The present invention is a processing apparatus provided with: a processing unit (10) that sprays a gas inside a main chamber (11); sealing chambers (13, 14) that link with both the inside and the outside of the main chamber (11); an evacuating unit (15) for evacuating the interior of the main chamber (11) and/or the sealing chambers (13, 14); and a control unit (17) that controls a first pressure differential between the pressure inside the sealing chambers (13, 14) and a first reference pressure. The evacuating unit (15) has a first evacuating system (150) that evacuates the inside of the sealing chambers (13, 14). The control unit (17) causes the operating mode to transition according to increases in the amount of gas spray inside the main chamber (11) from a first mode to a second mode, said first mode being a mode of operating the first evacuating system (150) by feedback control based on the first pressure differential, said second mode being a mode of operating the first evacuating system (150) by control different from the feedback control based on the first pressure differential. With this constitution, outflow of gas from the main chamber and inflow of outside air into the main chamber can be suppressed even if large amounts of gas are sprayed in a short period of time by the processing unit.

Inventors:
SEKIMOTO TATSUYA (JP)
IIZAKA JUNICHI (JP)
Application Number:
PCT/JP2014/052280
Publication Date:
August 07, 2014
Filing Date:
January 31, 2014
Export Citation:
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Assignee:
NIKON CORP (JP)
International Classes:
B05B15/12; C23C24/04; H01M4/04; H01M4/139; H01M4/1395
Foreign References:
JPS6171269U1986-05-15
JPH05311388A1993-11-22
JPH09105580A1997-04-22
JP2009293107A2009-12-17
Attorney, Agent or Firm:
NAGAI, Fuyuki et al. (JP)
Fuyuki Nagai (JP)
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