PROCESSING CONDITION SETTING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM

WIPO Patent Application WO/2018/225615

A1

The present method comprises: a step of capturing an image of a reference substrate, serving as a condition setting reference, using an image capture device in a substrate processing system, and acquiring the captured image of the reference substrate; a step of capturing, using the image capture device, an image of a processed substrate that has been subjected to a predetermined process under a current processing condition, and acquiring the captured image of the processed substrate; a step of calculating a color information error amount between the captured image of the processed substrate and the captured image of the reference substrate; and a step of, on the basis of a correlation model acquired in advance and the color information positional error amount, calculating a processing condition correction amount; and a step of setting a processing condition on the basis of the correction amount. The steps other than the step of acquiring the captured image of the reference substrate is performed for each processing device.

MORI TAKUYA (JP)
NISHIYAMA TADASHI (JP)
KIYOTOMI AKIKO (JP)
TOMITA HIROSHI (JP)

PCT/JP2018/020940

December 13, 2018

May 31, 2018

Click for automatic bibliography generation  

TOKYO ELECTRON LTD (JP)

H01L21/027; B05D1/40; B05D3/00; B05D3/06; H01L21/02

JP2017028086A	2017-02-02
JP2017022168A	2017-01-26
JP2003158056A	2003-05-30
JP2008270542A	2008-11-06
JP2000269190A	2000-09-29
JP2013084731A	2013-05-09
JP2015215193A	2015-12-03
JP2010010314A	2010-01-14

KANEMOTO, Tetsuo et al. (JP)

View/Download PDF      PDF Help

Previous Patent: CARBON/CARBON COMPOSITE SPRING ELEMENT AND MANUFACTURING METHOD THEREFOR

Next Patent: PRINTED CIRCUIT BOARD