PROCESSING DEVICE, EXHAUST SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Title:

PROCESSING DEVICE, EXHAUST SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2019/172274

Kind Code:

A1

Abstract:

The present invention provides a configuration having: a processing unit equipped with a treatment furnace inside a housing and having an opening portion formed in a side wall portion of the housing, said treatment furnace treating a substrate with a gas, said opening portion making maintenance possible; an exhaust unit installed such that a maintenance region is provided in a region facing the opening portion, and exhausting the gas from the treatment furnace; and an exhaust device installed such that a maintenance region is provided in a region facing the opening portion, and disposed adjacent to the side opposite to the processing unit side of the exhaust unit.

More Like This:

WO/2022/138788	SUBSTRATE FOR EPITAXIALLY GROWING DIAMOND CRYSTAL AND METHOD FOR MANUFACTURING DIAMOND CRYSTAL
JP2009088236	METHOD FOR FORMING FILM, APPARATUS FOR FORMING FILM, AND STORAGE MEDIUM

Inventors:

OKUNO MASANORI (JP)
YONEJIMA TOSHIHIKO (JP)
SAKATA MASAKAZU (JP)
YAUCHI MASAMICHI (JP)

Application Number:

PCT/JP2019/008692

Publication Date:

September 12, 2019

Filing Date:

March 05, 2019

Export Citation:

Click for automatic bibliography generation Help

Assignee:

KOKUSAI ELECTRIC CORP (JP)

International Classes:

H01L21/31; C23C16/44

Domestic Patent References:

WO2018003072A1

2018-01-04

Foreign References:

JP2012099763A	2012-05-24
JPH07240382A	1995-09-12
JP2002170781A	2002-06-14