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Title:
PROCESSING DEVICE AND PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/181809
Kind Code:
A1
Abstract:
Provided are a processing device (system) and a processing method with which good quality roll-to-roll processing can be performed simply and easily on both sides of a substrate under atmospheric pressure. A processing device (system) for processing a substrate using a mist or liquid droplets including a processing agent is provided with an accumulation unit for accumulating the mist or liquid droplets, and an impregnation unit for impregnating the substrate with the accumulated mist or liquid droplets. Using the processing device, the mist or liquid droplets are accumulated, and the substrate is processed by impregnating the substrate with the accumulated mist or liquid droplets.

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Inventors:
YAGYU SHINGO (JP)
HITORA TOSHIMI (JP)
Application Number:
PCT/JP2018/013444
Publication Date:
October 04, 2018
Filing Date:
March 29, 2018
Export Citation:
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Assignee:
FLOSFIA INC (JP)
International Classes:
H01L21/306; B08B3/02; H01L21/208; H01L21/304
Foreign References:
JP2009010033A2009-01-15
JP2016190174A2016-11-10
JP2002299582A2002-10-11
JP2010021320A2010-01-28
JP2010103190A2010-05-06
JPH11305184A1999-11-05
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