Title:
PROCESSING DEVICE AND PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/235455
Kind Code:
A1
Abstract:
This processing device is provided with a processing module, a load lock chamber, a vacuum transfer chamber, and a gas supplying part. The processing module includes a vacuum processing chamber for performing a process on a substrate in a vacuum atmosphere. The load lock chamber switches the atmosphere between the vacuum atmosphere and an ordinary-pressure atmosphere. The vacuum transfer chamber is provided between the vacuum processing chamber and the load lock chamber via gate valves therebetween, and allows the substrate to be transferred between the vacuum processing chamber and the load lock chamber by means of a substrate transfer mechanism. The gas supplying part supplies purge gas including reducing gas to at least one of the vacuum processing chamber, the load lock chamber, or the vacuum transfer chamber.
Inventors:
AKASAKA YASUSHI (JP)
TAKAHASHI TSUYOSHI (JP)
TAKAHASHI TSUYOSHI (JP)
Application Number:
PCT/JP2020/019325
Publication Date:
November 26, 2020
Filing Date:
May 14, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/31; H01L21/683
Foreign References:
| JP2011009762A | 2011-01-13 | |||
| JPS58161345A | 1983-09-24 | |||
| JP2018199601A | 2018-12-20 | |||
| US5434090A | 1995-07-18 | |||
| JP2003179075A | 2003-06-27 | |||
| JPH1187341A | 1999-03-30 | |||
| JP2017139274A | 2017-08-10 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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