Title:
PROCESSING FACILITY
Document Type and Number:
WIPO Patent Application WO/2012/001973
Kind Code:
A1
Abstract:
Disclosed is a processing facility which has a plurality of process chambers (21) disposed in one plane on a process floor (1) and a distribution floor (2) provided above the process floor to transport a carrier container (C). Furthermore, a delivery opening (22) is formed on a ceiling (11) between the process floor (1) and the distribution floor (2), so that an automated guided vehicle (5) travelling on the distribution floor (2) delivers the carrier container (C) between the process floor (1) and the distribution floor (2) through the delivery opening (22). Furthermore, a shelf (71) is provided on the distribution floor (2) to place the carrier container (C) along the guiding route on which the automated guided vehicle (5) travels. This has the effects of being capable of providing a processing facility which has a high degree of flexibility in planning the layout of a factory.
Inventors:
IDO MASATSUGU (JP)
KOSHIMIZU MAKOTO (JP)
KOSHIMIZU MAKOTO (JP)
Application Number:
PCT/JP2011/003736
Publication Date:
January 05, 2012
Filing Date:
June 29, 2011
Export Citation:
Assignee:
JGC CORP (JP)
IDO MASATSUGU (JP)
KOSHIMIZU MAKOTO (JP)
IDO MASATSUGU (JP)
KOSHIMIZU MAKOTO (JP)
International Classes:
B65G1/00
Foreign References:
| JPS5915610U | 1984-01-30 | |||
| JP2007031008A | 2007-02-08 | |||
| JP2007106528A | 2007-04-26 |
Attorney, Agent or Firm:
INOUE, TOSHIO (JP)
Toshio Inoue (JP)
Toshio Inoue (JP)
Download PDF:
Claims:
Previous Patent: MICROCHEMICAL CHIP, METHOD FOR PRODUCING SAME, AND METHOD FOR USING SAME
Next Patent: TERMINAL DEVICE
Next Patent: TERMINAL DEVICE