Title:
PROCESSING METHOD AND PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/181344
Kind Code:
A1
Abstract:
The processing system is provided with: a liquid supply device (20) capable of supplying a liquid; a liquid processing device for processing the liquid (CW) supplied from the liquid supply device such that pockets of non-liquid-immersion state are created in some regions including a target position (TA) on a prescribed surface; a beam emission unit (520) for emitting beams (LB1, LB2) toward the target position; and a moving device (12) for moving the prescribed surface. The beams are emitted at the target position in order to apply prescribed processing to the target position, the target position having been placed in the non-liquid-immersion state.
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Inventors:
SHIBAZAKI YUICHI (JP)
Application Number:
PCT/JP2018/012480
Publication Date:
October 04, 2018
Filing Date:
March 27, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
B22F3/105; B22F3/16; B23K26/146; B23K26/21; B23K26/34; B33Y10/00; B33Y30/00
Domestic Patent References:
| WO2015108546A2 | 2015-07-23 | |||
| WO2016185966A1 | 2016-11-24 |
Foreign References:
| JPS6383221A | 1988-04-13 | |||
| JP2000288751A | 2000-10-17 | |||
| JP2016535170A | 2016-11-10 | |||
| JP2005267746A | 2005-09-29 | |||
| JPH06155587A | 1994-06-03 | |||
| JP2014034712A | 2014-02-24 | |||
| JPH11324906A | 1999-11-26 | |||
| JP2015178191A | 2015-10-08 | |||
| US20030206820A1 | 2003-11-06 | |||
| US20120105867A1 | 2012-05-03 | |||
| US20080030852A1 | 2008-02-07 |
Other References:
See also references of EP 3610971A4
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
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