PROCESSING SYSTEM AND PROCESSING METHOD

WIPO Patent Application WO/2019/150480

A1

The processing system is equipped with a support device capable of supporting an object to be processed, a processing device that irradiates an energy beam to a region to be processed on the object to be processed, supplies a material to the region irradiated by the energy beam, and performs additional processing, and a repositioning device for changing the positional relationship of the energy beam irradiation region from the support device and the processing device. Additional processing is performed on a first region, which is part of the support device, and/or a second region, which is part of the object to be processed, to form a reference modeled object, and the processing device and/or the repositioning device is controlled using information relating to the reference modeled object.

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KAWAI HIDEMI (JP)

PCT/JP2018/003190

August 08, 2019

January 31, 2018

Click for automatic bibliography generation  

NIKON CORP (JP)

B29C64/268; B22F3/105; B22F3/16; B23K26/342; B29C64/153; B33Y10/00; B33Y30/00

WO2016173668A1	2016-11-03
WO2015141032A1	2015-09-24

US9205691B1	2015-12-08
JP2002210835A	2002-07-31
JP2003535712A	2003-12-02
JP2000326416A	2000-11-28
JP2018001725A	2018-01-11
JP2015196249A	2015-11-09

EGAMI, Tatsuo (JP)

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