Title:
PRODUCTION APPARATUS AND PRODUCTION METHOD OF ALKALINE WATER FOR ELECTRONIC DEVICE CLEANING
Document Type and Number:
WIPO Patent Application WO/2018/025592
Kind Code:
A1
Abstract:
Provided are production apparatus and production method of an alkaline water, which are capable of suppressing mixing of fine particles derived from a gas dissolving membrane device into a hydrogen water. A production apparatus of an alkaline water for electronic device cleaning, which is provided with: a pH adjusting device 11 for adjusting an ultrapure water to be alkaline; a deaeration device 13 for deaerating the ultrapure water, which has been adjusted to be alkaline; and a gas dissolving membrane device 14 for dissolving a functional gas into the deaerated ultrapure water through a gas dissolving membrane.
Inventors:
JIZAIMARU TAKAYUKI (JP)
Application Number:
PCT/JP2017/025209
Publication Date:
February 08, 2018
Filing Date:
July 11, 2017
Export Citation:
Assignee:
NOMURA MICRO SCIENCE KK (JP)
International Classes:
H01L21/304; B01D61/00; B01D71/26; B01D71/34; B01F1/00; C02F1/20; C02F1/68; C02F1/78
Foreign References:
| JP2004296463A | 2004-10-21 |
Attorney, Agent or Firm:
SAKURA PATENT OFFICE, P.C. (JP)
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