PRODUCTION DEVICE FOR INORGANIC COMPOUNDS AND A PRODUCTION METHOD FOR INORGANIC COMPOUNDS USING THE SAME

Title:

PRODUCTION DEVICE FOR INORGANIC COMPOUNDS AND A PRODUCTION METHOD FOR INORGANIC COMPOUNDS USING THE SAME

Document Type and Number:

WIPO Patent Application WO/2012/020986

Kind Code:

A3

Abstract:

Provided is a device for continuously producing an inorganic slurry by means of a hydrothermal method, and particularly, a hydrothermal synthesis device that comprises a reactor which has, inter alia, a precursor liquid-phase or slurry stream and a supercritical liquid-phase stream, and which continuously produces an inorganic slurry by means of a hydrothermal method, wherein the inflow direction of the precursor liquid-phase or slurry stream in the reactor is within a range of from 0 to 60 degrees relative to the discharge direction of an inorganic slurry stream (inorganic material stream) comprising the inorganic slurry. Also provided is a method for producing inorganic material by using the device.

Inventors:

NOH HYUN KUK (KR)
LEE EUN SANG (KR)
PARK KWANG SOO (KR)
PARK HONG KYU (KR)
JUNG WANG MO (KR)
OH SANG SEUNG (KR)
JEONG JUHYEONG (KR)

Application Number:

PCT/KR2011/005844

Publication Date:

May 31, 2012

Filing Date:

August 10, 2011

Export Citation:

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Assignee:

LG CHEMICAL LTD (KR)
NOH HYUN KUK (KR)
LEE EUN SANG (KR)
PARK KWANG SOO (KR)
PARK HONG KYU (KR)
JUNG WANG MO (KR)
OH SANG SEUNG (KR)
JEONG JUHYEONG (KR)

International Classes:

B01J3/06; C01B25/41; C01G49/06; C01G51/04

Foreign References:

JP2002102672A	2002-04-09
JP2001246239A	2001-09-11
JPH11267607A	1999-10-05

Other References: