Title:
PRODUCTION DEVICE FOR PH/REDOX POTENTIAL–ADJUSTED WATER
Document Type and Number:
WIPO Patent Application WO/2022/102252
Kind Code:
A1
Abstract:
This production device 1 for pH/redox potential–adjusted water has: a platinum group metal–loaded resin column 3 that is provided on a supply line 2 for ultrapure water W; and a pH adjuster tank 4 and a redox potential adjuster tank 5 that are provided downstream of the platinum group metal–loaded resin column 3. A membrane-type degassing device 6 is provided downstream of the pH adjuster tank 4 and the redox potential adjuster tank 5, and a gas dissolution membrane 7 is provided dowstream of the membrane-type degassing device 6. A rinse water quality monitoring mechanism that comprises a pH meter, an ORP meter, and an inert gas concentration measurement means is provided on the supply line 2 downstream of the gas dissolution membrane 7. The rinse water quality monitoring mechanism is connected to a control means that is not shown. The control means can control a pump 4B for the pH adjuster tank 4, a pump 5B for the redox potential adjuster tank 5, and the gas dissolution membrane 7 on the basis of measured values from the rinse water quality monitoring mechanism. The present invention thereby makes it possible to keep metal dissolution to a minimum during the rinsing of a wafer surface at which a chromium group element is exposed.
Inventors:
GAN NOBUKO (JP)
Application Number:
PCT/JP2021/034814
Publication Date:
May 19, 2022
Filing Date:
September 22, 2021
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
B01D61/00; C02F1/20; C02F1/58; C02F1/68
Domestic Patent References:
| WO2015045975A1 | 2015-04-02 | |||
| WO2020250495A1 | 2020-12-17 |
Foreign References:
| JP6299912B1 | 2018-03-28 | |||
| JP6299913B1 | 2018-03-28 | |||
| JP2019147112A | 2019-09-05 | |||
| JP2009219995A | 2009-10-01 | |||
| JP2000216130A | 2000-08-04 |
Attorney, Agent or Firm:
HAYAKAWA Yuzi et al. (JP)
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