PRODUCTION METHOD AND PRODUCTION DEVICE FOR NITROGEN COMPOUND

Title:

PRODUCTION METHOD AND PRODUCTION DEVICE FOR NITROGEN COMPOUND

Document Type and Number:

WIPO Patent Application WO/2017/078082

Kind Code:

A1

Abstract:

The present invention provides a method and a device which produce a nitrogen compound membrane by plasma without applying a voltage to a substrate and without the need of a large container, suitable for an increase in area, and employing a high-pressure process which uses little power. In the production of a nitrogen compound where microwave plasma is generated to produce the nitrogen compound, by applying the microwaves to a feedstock gas containing a nitrogen-based gas which is discharged from a nozzle to the surface of a substrate at a controlled rate, the plasma containing a nitrogen-based active species generated from the feedstock gas is emitted to the surface of the substrate. In this step, the pressure is set higher than a pressure at which the mean free path of ions of the plasma is smaller than the Debye length.

Inventors:

ITAGAKI HIROTOMO (JP)
SAKAKITA HAJIME (JP)
KIM JAEHO (JP)
OGURA MUTSUO (JP)
WANG XUELUN (JP)
HIROSE SHINGO (JP)

Application Number:

PCT/JP2016/082629

Publication Date:

May 11, 2017

Filing Date:

November 02, 2016

Export Citation:

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Assignee:

NAT INST ADVANCED IND SCIENCE & TECH (JP)

International Classes:

C23C8/36; C23C16/34; C23C16/511; C30B25/18; C30B29/38; H05H1/30

Domestic Patent References:

WO2015030191A1

2015-03-05

Foreign References:

JP2008515175A	2008-05-08
JPH0533120A	1993-02-09
JP2015510263A	2015-04-02
JP2008004540A	2008-01-10
JP2006100246A	2006-04-13

Other References: