Title:
PRODUCTION METHOD FOR ORGANIC SILICON COMPOUND HAVING KETIMINE STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2019/211921
Kind Code:
A1
Abstract:
An organic silicon compound having a ketimine structure having good storage stability can be obtained by a production method that produces an organic silicon compound having a ketimine structure indicated by formula (1) (R1 and R2 each independently indicating a C1–10 alkyl group or a C6–10 aryl group, R3 and R4 each independently indicating a hydrogen atom, a C1–10 alkyl group, or a C6–10 aryl group, n indicating an integer of 1–3, and m indicating an integer of 1–12). The production method includes a step (I) and a step (II) and has a chlorine atom content relative to the organic silicon compound indicated by formula (1) of less than 0.1 mass ppm. Step (I): A step in which an amino group-containing silicon compound indicated by formula (2) and a carbonyl compound indicated by formula (3) are caused to react. (R1–R4, n, and m are as described above.) Step (II): A step in which the chlorine atom content is reduced.
Inventors:
YASUDA SHIGEKI (JP)
HIROKAMI MUNENAO (JP)
HIROKAMI MUNENAO (JP)
Application Number:
PCT/JP2018/037712
Publication Date:
November 07, 2019
Filing Date:
October 10, 2018
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C07F7/18
Foreign References:
| JPH07247295A | 1995-09-26 | |||
| JPS5278834A | 1977-07-02 |
Other References:
See also references of EP 3789391A4
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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