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Title:
PRODUCTION METHOD FOR OXIDIZED CARBON THIN-FILM, ELEMENT HAVING OXIDIZED CARBON THIN-FILM, AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2012/070218
Kind Code:
A1
Abstract:
This production method for an oxidized carbon thin-film contains: a first step for preparing a carbon thin-film and an Fe2O3-containing iron oxide contacting the carbon thin-film; and a second step for forming an oxidized carbon thin-film having an oxidized section, by applying voltage or a current between the carbon thin-film and the iron oxide with the carbon thin-film side as the positive, which causes the section of the carbon thin-film in contact with the iron oxide to oxidize, and change into an oxidized section configured from oxidized carbon. This production method is a method by which it is possible to form a nanometer-order pattern for a carbon thin-film such as graphene. The damage imparted to the formed pattern is small, the affinity with semiconductor processing is high, and general application as a process technique for producing electronic devices is possible.

Inventors:
ODAGAWA AKIHIRO
MATSUKAWA NOZOMU
Application Number:
PCT/JP2011/006464
Publication Date:
May 31, 2012
Filing Date:
November 21, 2011
Export Citation:
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Assignee:
PANASONIC CORP (JP)
ODAGAWA AKIHIRO
MATSUKAWA NOZOMU
International Classes:
C01B31/02
Foreign References:
JP2009182173A2009-08-13
JP2003231097A2003-08-19
JP2010153793A2010-07-08
JP2000247740A2000-09-12
Other References:
S. MASUBUCHI: "Fabrication of graphene nanoribbon by local anodic oxidation lithography using atomic force microscope", APPLIED PHYSICS LETTERS, vol. 94, 2009, pages 082107 - 1 - 082107-3
K.S.NOVOSELOV ET AL.: "Electric Field Effect in Atomically Thin Carbon Films", SCIENCE, vol. 306, 2004, pages 666 - 669, XP009086357, DOI: doi:10.1126/science.1102896
MEIHUA JIN ET AL.: "Graphene oxide thin film field effect transistors without reduction", JOURNAL OF PHYSICS D APPLIED PHYSICS, 2009
TOMOKI MACHIDA: "Fabrication of Graphene Quantum Dots Using Scanning Probe Microscope Lithography", THE MURATA SCIENCE FOUNDATION NENPO, December 2010 (2010-12-01), pages 434 - 439
Attorney, Agent or Firm:
KAMADA, KOICHI (JP)
Koichi Kamata (JP)
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Claims: