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Title:
PRODUCTION METHOD FOR TRANSPARENT CONDUCTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2014/112536
Kind Code:
A1
Abstract:
This production method for a transparent conductive film involves a step (A) wherein a transparent conductive layer is formed on at least one surface of an organic polymer film substrate by means of a roll-to-roll apparatus, by RF-superimposed DC sputtering in which an indium-based composite oxide target is used in the presence of an inert gas in a high magnetic field in which the horizontal magnetic field at the surface of the target is 85 to 200 mT. The ratio of a tetravalent metal oxide in said target is 7 to 15 wt%, and is represented by {tetravalent metal oxide / (tetravalent metal oxide + indium oxide)} × 100 (%). The transparent conductive layer is a crystalline layer of the indium-based composite oxide. The thickness of the transparent conductive layer ranges from 10 nm to 40 nm. The resistivity of the transparent conductive layer is 1.3 × 10-4 to 2.8 × 10-4 Ω∙cm. The transparent conductive film obtained by this production method has low resistivity and surface resistance, and has a transparent conductive layer comprising a thin crystalline layer.

Inventors:
SASA KAZUAKI (JP)
YAMAMOTO YUSUKE (JP)
MACHINAGA HIRONOBU (JP)
Application Number:
PCT/JP2014/050600
Publication Date:
July 24, 2014
Filing Date:
January 15, 2014
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
H01B13/00; B32B7/02; B32B9/00; B32B15/08; C23C14/08; C23C14/34; C23C14/58; H01B5/14
Domestic Patent References:
WO2000051139A12000-08-31
WO2004105054A12004-12-02
Foreign References:
JP2005259628A2005-09-22
JP2007141755A2007-06-07
JP2003532997A2003-11-05
JP2011018623A2011-01-27
JPH03249171A1991-11-07
JP2006117967A2006-05-11
JPH07178863A1995-07-18
JP2004214184A2004-07-29
JP2005268113A2005-09-29
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
Patent business corporation ユニアス international patent firm (JP)
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