Title:
PROJECTION EXPOSURE APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2017/167258
Kind Code:
A1
Abstract:
Disclosed is a projection exposure apparatus; a focal plane measurement system (8) and an alignment measurement system (9) are arranged between a mask platform (3) and a working platform (4), the alignment measurement system (9) having a focal adjustment function; after the surface change of a substrate (5) is measured by means of the focal plane measurement system (8), the alignment measurement system (9) implements focal adjustment on the basis of the measurement data of the focal plane measurement system (8); after focal adjustment is completed, the coordinates of the points on the substrate (5) displayed in the alignment measurement system (8) are the coordinates of the points after the surface change of the substrate (5); by calculating the changes to the coordinates of the points, the relative positional relationship of a mask plate (2) and the substrate (5) having undergone the surface change can be obtained, and compensation can be implemented by means of moving the working platform (4). Thus, even if the focal plane measurements of the alignment measurement system (9) and the focal plane measurement system (8) are different, the error can be compensated by means of calculation and focal adjustment. Also disclosed is an exposure method for a projection apparatus.
Inventors:
CHEN YUEFEI (CN)
Application Number:
PCT/CN2017/078934
Publication Date:
October 05, 2017
Filing Date:
March 31, 2017
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD (CN)
International Classes:
G03F7/20; G03F9/00; H01L21/027
Foreign References:
| CN1459671A | 2003-12-03 | |||
| CN103186060A | 2013-07-03 | |||
| CN1487368A | 2004-04-07 | |||
| CN103246169A | 2013-08-14 | |||
| CN104950587A | 2015-09-30 | |||
| US5191200A | 1993-03-02 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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