Title:
PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2005096098
Kind Code:
A3
Abstract:
A projection objective (120) for microlithography serves for imaging a pattern of a mask (130) arranged in its object surface into an image field (104) arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis (121) of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an image side numerical aperture NA > 0.85 and a demagnifying imaging scale where IßI < 0.05, and the planar image field (104) having a minimum image field diameter suitable for microlithography of more than 1 mm.
Inventors:
DODOC AURELIAN (DE)
ULRICH WILHELM (DE)
BADER DIETER (DE)
EPPLE ALEXANDER (DE)
ULRICH WILHELM (DE)
BADER DIETER (DE)
EPPLE ALEXANDER (DE)
Application Number:
PCT/EP2005/002898
Publication Date:
July 06, 2006
Filing Date:
March 18, 2005
Export Citation:
Assignee:
ZEISS CARL SMT AG (DE)
DODOC AURELIAN (DE)
ULRICH WILHELM (DE)
BADER DIETER (DE)
EPPLE ALEXANDER (DE)
DODOC AURELIAN (DE)
ULRICH WILHELM (DE)
BADER DIETER (DE)
EPPLE ALEXANDER (DE)
International Classes:
G03F7/20; G03F1/00
Foreign References:
| US5999310A | 1999-12-07 | |||
| US6285488B1 | 2001-09-04 | |||
| US20010022691A1 | 2001-09-20 | |||
| DE1522285A1 | 1969-08-07 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 014, no. 415 (P - 1102) 7 September 1990 (1990-09-07)
Download PDF:
Previous Patent: FLASHLIGHT FOR FORMING UNIFORM IMAGE
Next Patent: REMOVAL OF PARTICLES GENERATED BY A RADIATION SOURCE
Next Patent: REMOVAL OF PARTICLES GENERATED BY A RADIATION SOURCE