Title:
PROJECTION OPTICAL SYSTEM, ALIGNER AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/105406
Kind Code:
A1
Abstract:
A projection optical system in which OoB irradiation dose on a wafer is reduced
while degradation in optical characteristics is suppressed. The projection
optical system comprises a first reflector exhibiting a reflectivity lower
than a predetermined value to a second wavelength light different from a predetermined
first wavelength light, and a second reflector exhibiting a reflectivity higher
than the predetermined value to the second wavelength light. When the reflectors
in the projection optical system is classified as reflectors (M1, M2, M5, M6)
having a high ratio of overlapped reflection regions corresponding to two different
points on the wafer, and reflectors (M3, M4) having a low ratio of overlapped reflection
regions the uppermost stream reflector (M3) in the optical path of the projection
optical system out of reflectors having a low ration of overlapped reflection
regions is the second reflector.
Inventors:
MURAKAMI, Katsuhiko (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 1008331, JP)
村上 勝彦 (〒31 東京都千代田区丸の内三丁目２番３号、株式会社ニコン内 Tokyo, 1008331, JP)
村上 勝彦 (〒31 東京都千代田区丸の内三丁目２番３号、株式会社ニコン内 Tokyo, 1008331, JP)
Application Number:
JP2007/052772
Publication Date:
September 20, 2007
Filing Date:
February 15, 2007
Export Citation:
Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo, 31, 1008331, JP)
株式会社ニコン (〒31 東京都千代田区丸の内三丁目２番３号 Tokyo, 1008331, JP)
MURAKAMI, Katsuhiko (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 1008331, JP)
株式会社ニコン (〒31 東京都千代田区丸の内三丁目２番３号 Tokyo, 1008331, JP)
MURAKAMI, Katsuhiko (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 1008331, JP)
International Classes:
H01L21/027; G02B13/14; G02B13/24; G02B17/00; G03F7/20
Attorney, Agent or Firm:
OKADA, FUSHIMI AND HIRANO, PC (NE Kudan Bldg, 2-7 Kudan-minami 3-chome, Chiyoda-k, Tokyo 74, 1020074, JP)
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