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Title:
PROJECTION OPTICAL SYSTEM, AND EXPOSURE APPARATUS AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2004/107011
Kind Code:
A1
Abstract:
A projection optical system of reflection/refraction type having an image forming ability thanks to favorable correction of the aberrations such as color aberration and field curvature, having a favorably reduced reflection loss at the reflective surfaces, and having a large effective image-side numerical aperture, so as to form a reduced image of the first surface (R) on the second surface (W). The projection optical system includes at least two reflective mirrors (CM1, CM2) and a border lens (Lb) having a first surface with positive refractive power. The optical path between the border lens (Lb) and the second surface is filled with a medium (Lm) having an index of refraction greater than 1.1. All the transparent members constituting the projection optical system and all the reflective members having a refractive power are arranged along a single optical axis (AX), and the optical system has an effective image-forming region not including the optical axis and having a predetermined shape.

Inventors:
OMURA YASUHIRO (JP)
Application Number:
PCT/JP2004/006417
Publication Date:
December 09, 2004
Filing Date:
May 06, 2004
Export Citation:
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Assignee:
NIKON CORP (JP)
OMURA YASUHIRO (JP)
International Classes:
G02B17/08; G03F7/20; (IPC1-7): G02B17/08; H01L21/027
Foreign References:
JP2003114387A2003-04-18
JP2001228401A2001-08-24
US4346164A1982-08-24
JPH10303114A1998-11-13
Other References:
See also references of EP 1630585A4
Attorney, Agent or Firm:
Hasegawa, Yoshiki (Ginza First Bldg. 10-6, Ginza 1-chome, Chuo-k, Tokyo 61, JP)
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