PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, EXPOSURE METHOD, DISPLAY MANUFACTURING METHOD, MASK, AND MASK MANUFACTURING METHOD

Title:

PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, EXPOSURE METHOD, DISPLAY MANUFACTURING METHOD, MASK, AND MASK MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2007/094198

Kind Code:

A1

Abstract:

An exposure device moves a first object (M) and a second object (P) along a scan direction and performs a projection exposure on the second object. The exposure device includes a first projection optical system (PL10) for forming an enlarged image of one part of the first object in a first region as one part of the region on the second object; and a second projection optical system (PL11) for forming an enlarged image of a part different from the aforementioned one part of the first object on a second region different from the aforementioned one part on the second object. The exposure device further includes a first stage (MST) for holding the first object and making at least one of the aforementioned one part and the aforementioned different part movable along a non-scan direction. The first region and the second region are arranged at a predetermined interval along the non-scan direction intersecting the scan direction.

Inventors:

KUMAZAWA MASATO (JP)
FUKUI TATSUO (JP)

Application Number:

PCT/JP2007/051974

Publication Date:

August 23, 2007

Filing Date:

February 06, 2007

Export Citation:

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Assignee:

NIKON CORP (JP)
KUMAZAWA MASATO (JP)
FUKUI TATSUO (JP)

International Classes:

H01L21/027; G02B17/08; G03F1/00

Foreign References:

JP2004335864A	2004-11-25
JPH11265848A	1999-09-28
JPH08250399A	1996-09-27
JP2004327660A	2004-11-18
JP2005024941A	2005-01-27
JP2005039211A	2005-02-10
JP2001168003A	2001-06-22
JP2000331909A	2000-11-30
JPH05161588A	1993-06-29
JP2006039446A	2006-02-09
JP2007014631A	2007-01-25

Other References: