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Title:
PROJECTION OPTICAL SYSTEM, METHOD FOR ADJUSTING PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2015/041335
Kind Code:
A1
Abstract:
Provided is a projection optical system in which, for example, wave aberration caused by light irradiation can be adjusted. This projection optical system forms an image of a first surface on a second surface. The projection optical system comprises: a first image-forming optical unit that is arranged in an optical path between the first surface and the second surface, and that includes a first concave-surface reflection mirror having a deformable reflection surface; and a second image-forming optical unit that is arranged in an optical path between the first image-forming optical unit and the second surface, and that includes a second concave-surface reflection mirror having a deformable reflection surface.

Inventors:
TSUGE YOSUKE (JP)
ONO TAKURO (JP)
OHMURA YASUHIRO (JP)
YUASA YOSHIHARU (JP)
HASEGAWA KEISUKE (JP)
Application Number:
PCT/JP2014/074896
Publication Date:
March 26, 2015
Filing Date:
September 19, 2014
Export Citation:
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Assignee:
NIKON CORP (JP)
International Classes:
G02B17/08; G02B13/24; H01L21/027
Domestic Patent References:
WO2012041459A22012-04-05
Foreign References:
JP2004317534A2004-11-11
JP2005107362A2005-04-21
JP2007508591A2007-04-05
JP2007013179A2007-01-18
JP2007005558A2007-01-11
JP2011013681A2011-01-20
JP2008177575A2008-07-31
Attorney, Agent or Firm:
YAMAGUCHI TAKAO (JP)
Takao Yamaguchi (JP)
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