Title:
PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO2004019128
Kind Code:
A3
Abstract:
Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
Inventors:
OMURA YASUHIRO (JP)
IKEZAWA HIRONORI (JP)
WILLIAMSON DAVID M (GB)
IKEZAWA HIRONORI (JP)
WILLIAMSON DAVID M (GB)
Application Number:
PCT/JP2003/010665
Publication Date:
October 28, 2004
Filing Date:
August 22, 2003
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
OMURA YASUHIRO (JP)
IKEZAWA HIRONORI (JP)
WILLIAMSON DAVID M (GB)
OMURA YASUHIRO (JP)
IKEZAWA HIRONORI (JP)
WILLIAMSON DAVID M (GB)
International Classes:
G02B13/14; G02B13/18; G02B13/24; G02B17/08; G03F7/20; H01L21/027; (IPC1-7): G03F7/20
Domestic Patent References:
| WO2003077037A1 | 2003-09-18 |
Foreign References:
| US6191429B1 | 2001-02-20 | |||
| EP0605103B1 | 1998-10-14 | |||
| US20030030916A1 | 2003-02-13 | |||
| JP2002244035A | 2002-08-28 |
Other References:
See also references of EP 1532489A2
Download PDF:
Previous Patent: METHOD AND APPARATUS FOR EXTENDING SIGNAL RANGE
Next Patent: PROCESS FOR PRODUCING A PATTERNED OXIDE FILM ON A SUBSTRATE
Next Patent: PROCESS FOR PRODUCING A PATTERNED OXIDE FILM ON A SUBSTRATE