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Title:
PROPYLENE-BASED RESIN COMPOSITION, FILM COMPRISING SAME, AND USES THEREOF
Document Type and Number:
WIPO Patent Application WO/2019/189486
Kind Code:
A1
Abstract:
[Problem] To provide: a propylene-based resin composition capable of giving films which are highly excellent in terms of not only low-temperature impact resistance and heat-seal strength after retortion but also rigidity and transparency and which are suitable for use as high-retortion CPP; a film comprising the propylene-based resin composition; and a laminate and a retort pouch. [Solution] The propylene-based resin composition of the present invention comprises 75-95 mass% propylene/ethylene block copolymer (A) satisfying requirements (a-1) to (a-4) and 5-25 mass% specific ethylene/α-olefin copolymer (B). (a-1) The MFR is 2.0-8.0 g/10 min. (a-2) The content of para-xylene solubles is 15 mass% or higher, and the content (mass%) of para-xylene solubles and the content (mass%) of n-decane solubles satisfy specific relationship (1). (a-3) The content of ethylene-derived structural units in the para-xylene solubles is 20-30 mass%. (a-4) The isotactic pentad content in para-xylene insolubles is 94 mol% or higher.

Inventors:
KIMURA TOKUTARO (JP)
KOJIMA TERUHISA (JP)
SHIMIZU HIROKI (JP)
Application Number:
PCT/JP2019/013399
Publication Date:
October 03, 2019
Filing Date:
March 27, 2019
Export Citation:
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Assignee:
PRIME POLYMER CO LTD (JP)
International Classes:
C08L53/00; B32B27/32; B65D65/40; B65D81/24; C08F297/08; C08J5/18; C08L23/08
Foreign References:
JP2012082356A2012-04-26
JP2001098139A2001-04-10
JP2003183462A2003-07-03
JP2003096251A2003-04-03
JP2000256532A2000-09-19
JP2002088170A2002-03-27
JP2003052791A2003-02-25
JP2000007853A2000-01-11
JP2001288330A2001-10-16
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
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