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Patent Searching and Data


Title:
PROTECTION DEVICE, MASK, AND EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/094197
Kind Code:
A1
Abstract:
A mask (M) has a pattern to be transferred onto a sensing substrate. The mask (M) includes a film (10) arranged at a position apart from the surface where the pattern is formed. The film (10) relatively transmits light of a necessary wavelength range and does not relatively transmit light of an unnecessary wavelength range among the light applied to the surface where the pattern is formed.

Inventors:
HIRAYANAGI NORIYUKI (JP)
Application Number:
PCT/JP2007/051973
Publication Date:
August 23, 2007
Filing Date:
February 06, 2007
Export Citation:
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Assignee:
NIKON CORP (JP)
HIRAYANAGI NORIYUKI (JP)
International Classes:
H01L21/027; G03F1/24; G03F1/62
Foreign References:
JP2006504996A2006-02-09
JP2005046895A2005-02-24
Attorney, Agent or Firm:
FUJIMOTO, Yoshihiro (14-7 Minamiaoyama 1-chom, Minato-ku Tokyo 62, JP)
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