Title:
PROTECTIVE AND/OR DIFFUSION BARRIER LAYER
Document Type and Number:
WIPO Patent Application WO2001055489
Kind Code:
A3
Abstract:
The invention relates to a chemical, mechanical and/or optical protective and/or diffusion barrier layer (16) disposed on a metal or plastic substrate (14). Said layer consists of an organic layer matrix (10) with metal-containing particles (12) dispersed therein said metal-containing organic layer (16) being plasma-polymerized starting from at least one hydrocarbon which can be substituted and one metal-containing component. The protective and/or diffusion barrier layer (16) is used in a thickness (d) in the submicron range and contains metal particles (12) finely dispersed therein, that have a grain size that lies below 50 % of the layer thickness (d). The organic layer matrix (10) is deposited by plasma polymerization from a process gas that comprises at least one hydrocarbon that can also be substituted and one metal-containing component and/or an inorganic gas in a reactor that can be evacuated. During the progression of the process organic monomers having different polarities and/or metal-containing components having different concentrations can be introduced into the reactor. The protective and/or diffusion barrier layer (16) is for example used as anticorrosive layer of metal substrates (14) or as a flexible diffusion barrier with an adjustable electroconductivity for plastic packagings. The inventive method is inter alia used for providing fibers, whiskers and rods with an electroconductive coating.
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Inventors:
MOSER EVA MARIA (CH)
Application Number:
PCT/CH2001/000059
Publication Date:
February 14, 2002
Filing Date:
January 26, 2001
Export Citation:
Assignee:
INCOAT GMBH (CH)
MOSER EVA MARIA (CH)
MOSER EVA MARIA (CH)
International Classes:
B05D7/24; C09D5/08; C23C16/26; D06M10/10; D06M11/83; D06M14/18; (IPC1-7): B05D7/24; C23C16/30
Domestic Patent References:
WO1999063129A1 | 1999-12-09 |
Foreign References:
EP0423996A1 | 1991-04-24 |
Other References:
YOSHIHIRO ASANO: "METAL-CONTAINING PLASMA-POLYMERIZED FILMS", THIN SOLID FILMS., vol. 105, no. 1, July 1983 (1983-07-01), ELSEVIER-SEQUOIA S.A. LAUSANNE., CH, pages 1 - 8, XP002139236, ISSN: 0040-6090
BIEDERMAN H ET AL: "METAL DOPED FLUOROCARBON POLYMER FILMS PREPARED BY PLASMA POLYMERIZATION USING AN RF PLANAR MAGNETRON TARGET", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH,NL,NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, vol. 212, no. 1/03, 1 July 1983 (1983-07-01), pages 497 - 503, XP002032591
A.M. WROBEL ET AL.: "Plasma Chemical Vapor deposition of Iron- COntaining Hydrogennated Carbon Films Using a Single-Source Precursor", JOURNAL OF CHEMICAL VAPOR DEPOSITION., vol. 1, July 1992 (1992-07-01), TECHNOMIC PUBLISHING, LANCASTER, PA., US, pages 42 - 58, XP000901787, ISSN: 1056-7860
PATENT ABSTRACTS OF JAPAN vol. 017, no. 146 (C - 1039) 24 March 1993 (1993-03-24)
BIEDERMAN H ET AL: "METAL DOPED FLUOROCARBON POLYMER FILMS PREPARED BY PLASMA POLYMERIZATION USING AN RF PLANAR MAGNETRON TARGET", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH,NL,NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, vol. 212, no. 1/03, 1 July 1983 (1983-07-01), pages 497 - 503, XP002032591
A.M. WROBEL ET AL.: "Plasma Chemical Vapor deposition of Iron- COntaining Hydrogennated Carbon Films Using a Single-Source Precursor", JOURNAL OF CHEMICAL VAPOR DEPOSITION., vol. 1, July 1992 (1992-07-01), TECHNOMIC PUBLISHING, LANCASTER, PA., US, pages 42 - 58, XP000901787, ISSN: 1056-7860
PATENT ABSTRACTS OF JAPAN vol. 017, no. 146 (C - 1039) 24 March 1993 (1993-03-24)
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