Title:
PSEUDO DEFECT SAMPLE AND METHOD OF MANUFACTURING SAME, ULTRASOUND FLAW DETECTION MEASUREMENT CONDITION ADJUSTING METHOD, TARGET MATERIAL INSPECTING METHOD, AND METHOD OF MANUFACTURING SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2018/139330
Kind Code:
A1
Abstract:
The present invention provides a pseudo defect sample for adjusting an ultrasound flaw detection measurement condition for inspecting defects inside a target material, wherein the pseudo defect sample is provided with a base plate including a first surface and a second surface opposing the first surface, and the base plate has formed therein a counterbore from the first surface side to a first depth, and a flat-bottomed hole in a portion of the counterbore from a bottom surface of the counterbore to a second depth, and wherein a ratio φ/d of an equivalent circle diameter φ of the flat-bottomed hole to a second depth d of the flat-bottomed hole is at least equal to 0.08 and less than 0.40 when the equivalent circle diameter φ of the flat-bottomed hole is less than 0.3 mm, at least equal to 0.1 and less than 0.60 when the equivalent circle diameter φ of the flat-bottomed hole is at least equal to 0.3 mm and less than 0.4 mm, and at least equal to 0.11 and less than 1.60 when the equivalent circle diameter φ of the flat-bottomed hole is at least equal to 0.4 mm.
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Inventors:
SUGAWARA HIROAKI (JP)
NISHIOKA KOJI (JP)
NISHIOKA KOJI (JP)
Application Number:
PCT/JP2018/001351
Publication Date:
August 02, 2018
Filing Date:
January 18, 2018
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
G01N29/30
Foreign References:
| JP2010145401A | 2010-07-01 | |||
| JPS56107156A | 1981-08-25 | |||
| JPS6196461A | 1986-05-15 | |||
| JPH0727751A | 1995-01-31 | |||
| US20070028661A1 | 2007-02-08 | |||
| US6439054B1 | 2002-08-27 | |||
| CN104777237A | 2015-07-15 | |||
| CN103235045A | 2013-08-07 | |||
| JP2017207345A | 2017-11-24 |
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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