Title:
PULSED CATHODIC ARC PLASMA SOURCE
Document Type and Number:
WIPO Patent Application WO2005089272
Kind Code:
B1
Abstract:
The present invention provides a pulsed plasma arc source (9) capable of applying diamond-like carbon coatings, other hard wear resistant coatings or metal coatings to a substrate (1). The pulsed plasma arc source (9) is based on the use of a magnetron sputtering system (9) for initiation of the pulsed arc discharge. The pulsed plasma arc source (9) can be scale up to coat large substrates (1).
Inventors:
SKOTHEIM TERJE ASBJORN (US)
SHELEH ULADZIMIR ULADZIMIRAVIC (BY)
KIRPILENKO GRIGORY GRIGORIEVIC (RU)
SHELEH ULADZIMIR ULADZIMIRAVIC (BY)
KIRPILENKO GRIGORY GRIGORIEVIC (RU)
Application Number:
PCT/US2005/008437
Publication Date:
November 02, 2006
Filing Date:
March 15, 2005
Export Citation:
Assignee:
SKOTHEIM TERJE ASBJORN (US)
SHELEH ULADZIMIR ULADZIMIRAVIC (BY)
KIRPILENKO GRIGORY GRIGORIEVIC (RU)
SHELEH ULADZIMIR ULADZIMIRAVIC (BY)
KIRPILENKO GRIGORY GRIGORIEVIC (RU)
International Classes:
C23C14/00; C23C14/06; C23C14/22; C23C14/32
Download PDF: