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Title:
PURIFICATION METHOD FOR PURIFYING LIQUID, PURIFICATION METHOD FOR PURIFYING SILICON COMPOUND-CONTAINING LIQUID, METHOD FOR PRODUCING SILYLATING AGENT LIQUID, FILM FORMING MATERIAL OR DIFFUSING AGENT COMPOSITION, FILTER MEDIUM AND FILTER DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/082088
Kind Code:
A1
Abstract:
To provide: a purification method which uses a polyimide and/or polyamide imide porous membrane that exhibits excellent removal performance for impurities such as metals, and wherein a liquid that is a silylating agent liquid, a film forming material or a diffusing agent composition is an object to be purified; a purification method for purifying a silicon compound-containing liquid that contains a silicon compound which is capable of producing a silanol group by hydrolysis; a method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, which uses the purification method; a filter medium which is composed of the above-described porous membrane; and a filter device which comprises the above-described porous membrane. A purification method for purifying a liquid, which comprises a step in which some or all of the liquid is caused to permeate through a polyimide and/or polyamide imide porous membrane having communicating pores from one side to the other side by means of differential pressure, and wherein the liquid is a silylating agent liquid, a film forming material or a diffusing agent composition that is used for diffusing a dopant into a semiconductor substrate.

Inventors:
SAWADA, Yoshihiro (150, Nakamaruko, Nakahara-ku, Kawasaki-sh, Kanagawa 12, 〒2110012, JP)
SUGAWARA, Tsukasa (150, Nakamaruko, Nakahara-ku, Kawasaki-sh, Kanagawa 12, 〒2110012, JP)
Application Number:
JP2016/082140
Publication Date:
May 18, 2017
Filing Date:
October 28, 2016
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO., LTD. (150 Nakamaruko, Nakahara-ku Kawasaki-sh, Kanagawa 12, 〒2110012, JP)
International Classes:
B01D71/64; B01D69/00; B01D71/70; C08G73/06; C08J9/26; H01L21/225
Domestic Patent References:
WO2011155407A12011-12-15
WO2015020101A12015-02-12
Foreign References:
JP2010270185A2010-12-02
JP2015165009A2015-09-17
JP2009138083A2009-06-25
JP2008056737A2008-03-13
Attorney, Agent or Firm:
SHOBAYASHI, Masayuki (Sapia Tower, 1-7-12 Marunouchi, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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