Title:
QUINONEDIAZIDE PHOTOSENSITIZER SOLUTION AND POSITIVE-TYPE RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/058789
Kind Code:
A1
Abstract:
Disclosed is a quinonediazide photosensitizer solution comprising a quinonediazide photosensitizer dissolved in an organic solvent so that the precipitation of the quinonediazide photosensitizer from a positive-type resist composition can be reduced or prevented without requiring any thermal modification treatment and the dissolution of the quinonediazide photosensitizer in the positive-type resist composition can be facilitated in the preparation of the positive-type resist composition. The quinonediazide photosensitizer solution contains a thiol compound as an agent for preventing the precipitation of the quinonediazide photosensitizer. The positive-type resist composition comprises an alkali-soluble resin, a cross-linking agent, a quinonediazide photosensitizer, and a thiol compound as an agent for preventing the precipitation of the quinonediazide photosensitizer.
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Inventors:
KANAYA HIROKI (JP)
Application Number:
PCT/JP2010/061537
Publication Date:
May 19, 2011
Filing Date:
July 07, 2010
Export Citation:
Assignee:
SONY CHEM & INF DEVICE CORP (JP)
KANAYA HIROKI (JP)
KANAYA HIROKI (JP)
International Classes:
G03F7/004; C07C303/42; C07C309/76; G03F7/022
Foreign References:
| JP2009091413A | 2009-04-30 | |||
| JP2007017959A | 2007-01-25 | |||
| JPS58182633A | 1983-10-25 | |||
| JP2007094011A | 2007-04-12 |
Attorney, Agent or Firm:
TAJIME & TAJIME (JP)
Patent business corporation Tajime international patent firm (JP)
Patent business corporation Tajime international patent firm (JP)
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