Title:
RADIATION ANALYSIS SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/091189
Kind Code:
A3
Abstract:
A radiation analysis system comprising a target comprising two marks which are separated from each other, the target being configured to undergo thermal expansion when illuminated with radiation; a position measurement system configured to measure a change in the separation of the marks; and a processor configured to determine a power of the radiation using the measured change in separation of the marks.
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Inventors:
VAN DE KERKHOF MARCUS (NL)
Application Number:
PCT/EP2017/075002
Publication Date:
August 02, 2018
Filing Date:
October 02, 2017
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G03F7/20; G01K17/00
Domestic Patent References:
| WO2015185269A1 | 2015-12-10 |
Foreign References:
| US5325180A | 1994-06-28 | |||
| US5892237A | 1999-04-06 | |||
| US5316380A | 1994-05-31 |
Attorney, Agent or Firm:
SLENDERS, Peter (NL)
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