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Patent Searching and Data


Title:
RADIATION ANALYSIS SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/091189
Kind Code:
A3
Abstract:
A radiation analysis system comprising a target comprising two marks which are separated from each other, the target being configured to undergo thermal expansion when illuminated with radiation; a position measurement system configured to measure a change in the separation of the marks; and a processor configured to determine a power of the radiation using the measured change in separation of the marks.

Inventors:
VAN DE KERKHOF, Marcus, Adrianus (P.O. Box 324, 5500 AH Veldhoven, 5500 AH, NL)
Application Number:
EP2017/075002
Publication Date:
May 24, 2018
Filing Date:
October 02, 2017
Export Citation:
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Assignee:
ASML NETHERLANDS B.V. (P.O. Box 324, 5500 AH Veldhoven, 5500 AH, NL)
International Classes:
G03F7/20; G01K17/00
Domestic Patent References:
WO2015185269A12015-12-10
Foreign References:
US5325180A1994-06-28
US5892237A1999-04-06
US5316380A1994-05-31
Attorney, Agent or Firm:
SLENDERS, Peter (P.O. Box 324, 5500 AH Veldhoven, 5500 AH, NL)
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