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Title:
RADIATION CURABLE COMPOSITIONS
Document Type and Number:
WIPO Patent Application WO2002041078
Kind Code:
A3
Abstract:
A photo-resist composition is disclosed that is a partial esterification product of a styrene maleic anhydride copolymer with (meth)acrylate and hydroxyl containing side chains. An amide containing (meth)acrylate is optionally present. These compositions exhibit a good balance between UV cure rate, tack free properties, and dissolution of uncured composition by dilute alkaline solution.

Inventors:
ALIAS NORAZMI (MY)
VERSCHUEREN KRIS (BE)
Application Number:
PCT/EP2001/013250
Publication Date:
August 08, 2002
Filing Date:
November 16, 2001
Export Citation:
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Assignee:
UCB SA (BE)
ALIAS NORAZMI (MY)
VERSCHUEREN KRIS (BE)
International Classes:
C08F290/12; C08F299/00; G03F7/027; G03F7/033; G03F7/038; (IPC1-7): G03F7/038; C08F8/00; G03F7/033
Foreign References:
US6045973A2000-04-04
US4722947A1988-02-02
US4284776A1981-08-18
Other References:
DATABASE WPI Section Ch Week 198808, Derwent World Patents Index; Class A18, AN 1988-054495, XP002133963
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