Title:
RADIATION PATTERNABLE CVD FILM
Document Type and Number:
WIPO Patent Application WO/2012/048108
Kind Code:
A3
Abstract:
Methods for forming photoresists sensitive to radiation on a substrate are provided. Described are chemical vapor deposition methods of forming films (e.g., silicon-containing films) as photoresists using a plasma which may be exposed to radiation to form a pattern. The deposition methods utilize precursors with cross- linkable moieties that will cross-link upon exposure to radiation. Radiation may be carried out in the with or without the presence of oxygen. Exposed or unexposed areas may then be developed in an aqueous base developer.
Inventors:
WEIDMAN TIMOTHY W (US)
MICHAELSON TIMOTHY (US)
DEATON PAUL (US)
INGLE NITIN K (US)
MALLICK ABHIJIT BASU (US)
CHATTERJEE AMIT (US)
MICHAELSON TIMOTHY (US)
DEATON PAUL (US)
INGLE NITIN K (US)
MALLICK ABHIJIT BASU (US)
CHATTERJEE AMIT (US)
Application Number:
PCT/US2011/055102
Publication Date:
July 05, 2012
Filing Date:
October 06, 2011
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
WEIDMAN TIMOTHY W (US)
MICHAELSON TIMOTHY (US)
DEATON PAUL (US)
INGLE NITIN K (US)
MALLICK ABHIJIT BASU (US)
CHATTERJEE AMIT (US)
WEIDMAN TIMOTHY W (US)
MICHAELSON TIMOTHY (US)
DEATON PAUL (US)
INGLE NITIN K (US)
MALLICK ABHIJIT BASU (US)
CHATTERJEE AMIT (US)
International Classes:
H01L21/027; H01L21/205
Foreign References:
| US20090208880A1 | 2009-08-20 | |||
| KR20010019924A | 2001-03-15 | |||
| US6262181B1 | 2001-07-17 |
Attorney, Agent or Firm:
CRISTALDI, Michelle (33 Wood Avenue SouthSecond Floor, Suite 21, Iselin New Jersey, US)
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