Title:
RADIATION SENSITIVE COMPOSITION, LIGHT-BLOCKING FILM AND SOLID-STATE IMAGING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2013/161976
Kind Code:
A1
Abstract:
To provide a radiation-sensitive composition which is capable of forming a film that has high adhesion to a substrate and long development latitude. A radiation-sensitive composition, which contains a compound represented by general formula (1), titanium black particles, a dispersant and an organic solvent, and wherein: a material to be dispersed including the titanium black particles has a BET specific surface area within the range of 20-120 m2/g; the material to be dispersed including the titanium black particles contains Si atoms; and the content ratio of the Si atoms to the Ti atoms in the material to be dispersed is within the range of 0.01-0.45.
AA General formula (1)
Inventors:
MURAYAMA SATORU (JP)
MURO NAOTSUGU (JP)
MURO NAOTSUGU (JP)
Application Number:
PCT/JP2013/062327
Publication Date:
October 31, 2013
Filing Date:
April 26, 2013
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; G02B5/00; G02B5/20; G03F7/027; G03F7/031; G03F7/033; H01L27/14
Foreign References:
| JP2011209653A | 2011-10-20 | |||
| JP2008083508A | 2008-04-10 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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