Title:
RADIATION-SENSITIVE COMPOSITION, MANUFACTURING METHOD THEREFOR, CURED FILM, COLOR FILTER, MANUFACTURING METHOD THEREFOR, PATTERNING METHOD, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/129521
Kind Code:
A1
Abstract:
This invention provides a radiation-sensitive composition that minimizes residue and exogenous substances while exhibiting good long-duration post-exposure delay characteristics. This invention also provides a method for manufacturing said radiation-sensitive composition, a cured film, a color filter, a manufacturing method therefor, a patterning method, a solid-state imaging element, and an image display device. This radiation-sensitive composition contains a resin and pigments including C.I. Pigment Green 36, C.I. Pigment Yellow 150, and C.I. Pigment Yellow 185. C.I. Pigment Green 36 constitutes 80-86% of the total mass of the pigments in this radiation-sensitive composition, and the mass ratio of C.I. Pigment Yellow 150 to C.I. Pigment Yellow 185 is between 65.4:35.6 and 79.0:21.0, inclusive. The acid value of the resin is between 20 and 50 mg KOH/g, inclusive, and the ratio between the amine value of the resin and the acid value of the resin is between 0.85 and 1.45, inclusive.
Inventors:
TAKAHASHI KAZUTAKA (JP)
Application Number:
PCT/JP2015/054421
Publication Date:
September 03, 2015
Filing Date:
February 18, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/20; C09B67/22; G03F7/004; C09B45/14; C09B45/22; C09B47/10; H01L27/14
Foreign References:
| JP2012198408A | 2012-10-18 | |||
| JP2005173287A | 2005-06-30 | |||
| JP2011068866A | 2011-04-07 | |||
| JP2009025782A | 2009-02-05 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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