Title:
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE
Document Type and Number:
WIPO Patent Application WO/2023/189503
Kind Code:
A1
Abstract:
The present invention causes a radiation-sensitive composition to contain a polymer including acid-labile group and a compound (Q) given by formula (1). In formula (1), L1 represents an ester group, -CO-NR3-, a (thio) ether group, or a sulfonyl group. L2 represents a single bond or a divalent linking group.
Inventors:
NEMOTO RYUICHI (JP)
FURUICHI KOTA (JP)
NAKAMURA RYOSUKE (JP)
FURUKAWA TSUYOSHI (JP)
FURUICHI KOTA (JP)
NAKAMURA RYOSUKE (JP)
FURUKAWA TSUYOSHI (JP)
Application Number:
PCT/JP2023/009713
Publication Date:
October 05, 2023
Filing Date:
March 13, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C07C309/12; C07C309/17; C07C309/27; C07D307/00; C07D327/04; C07D327/06; C09K3/00; G03F7/038; G03F7/039; G03F7/20; G03F7/32
Domestic Patent References:
| WO2020045535A1 | 2020-03-05 | |||
| WO2020261753A1 | 2020-12-30 | |||
| WO2022172689A1 | 2022-08-18 |
Foreign References:
| JP2020173436A | 2020-10-22 | |||
| JP2020075903A | 2020-05-21 | |||
| JP2020203984A | 2020-12-24 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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