Title:
RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/168221
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a radiation sensitive composition which has excellent coating properties and storage stability; and a pattern forming method which uses this radiation sensitive composition. The present invention is a radiation sensitive composition which contains a solvent and a compound that has a metal-oxygen covalent bond, and wherein: the metal is a metal element of the fourth to seventh row in group 3 to group 15 of the periodic table; the solvent contains a first solvent that has a viscosity at 20°C of 10 mPa·s or less and a vapor pressure at 20°C of 5 kPa or less, and a second solvent that is different from the first solvent and has a van der Waals volume of 150 Å3 or less; and the second solvent is water, a monovalent alcohol represented by R1-OH, R2-COOH or a combination of these solvents, wherein R1 is a monovalent organic group having 1 to 4 carbon atoms (inclusive) and R2 is a monovalent organic group having 1 to 30 carbon atoms (inclusive). It is preferable that the content of the first solvent in the whole solvent is from 50% by mass to 90% by mass (inclusive).
Inventors:
NAKAGAWA HISASHI (JP)
MINEGISHI SHINYA (JP)
SHIRATANI MOTOHIRO (JP)
MINEGISHI SHINYA (JP)
SHIRATANI MOTOHIRO (JP)
Application Number:
PCT/JP2018/002597
Publication Date:
September 20, 2018
Filing Date:
January 26, 2018
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/038; G03F7/20
Domestic Patent References:
| WO2015137193A1 | 2015-09-17 | |||
| WO2016043200A1 | 2016-03-24 |
Foreign References:
| JP2015199916A | 2015-11-12 | |||
| JP2015149475A | 2015-08-20 | |||
| JPH01125907A | 1989-05-18 | |||
| JPH08146610A | 1996-06-07 | |||
| JP2000298347A | 2000-10-24 |
Other References:
See also references of EP 3598232A4
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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