Title:
RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN
Document Type and Number:
WIPO Patent Application WO/2008/029673
Kind Code:
A1
Abstract:
A radiation-sensitive composition which comprises: (A) a low-molecular compound having, per molecule, one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon irradiation with actinic rays or a radiation and having a number-average molecular weight (Mn) in terms of polystyrene as measured by gel permeation chromatography (GPC) of 500-4,000; and (B) a solvent.
Inventors:
MATSUMURA, Nobuji (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 10, 1048410, JP)
松村 信司 (〒10 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1048410, JP)
SHIMIZU, Daisuke (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 10, 1048410, JP)
松村 信司 (〒10 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1048410, JP)
SHIMIZU, Daisuke (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 10, 1048410, JP)
Application Number:
JP2007/066644
Publication Date:
March 13, 2008
Filing Date:
August 28, 2007
Export Citation:
Assignee:
JSR CORPORATION (6-10, Tsukiji 5-chomeChuo-ku, Tokyo 10, 1048410, JP)
ＪＳＲ株式会社 (〒10 東京都中央区築地五丁目６番１０号 Tokyo, 1048410, JP)
MATSUMURA, Nobuji (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 10, 1048410, JP)
松村 信司 (〒10 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1048410, JP)
ＪＳＲ株式会社 (〒10 東京都中央区築地五丁目６番１０号 Tokyo, 1048410, JP)
MATSUMURA, Nobuji (6-10 Tsukiji 5-chome, Chuo-k, Tokyo 10, 1048410, JP)
松村 信司 (〒10 東京都中央区築地五丁目６番１０号 ＪＳＲ株式会社内 Tokyo, 1048410, JP)
International Classes:
G03F7/004; C07C309/12; C07C381/12; G03F7/039; H01L21/027
Attorney, Agent or Firm:
WATANABE, Kazuhira (3rd Fl, No.8 Kikuboshi Tower Building20-18, Asakusabashi 3-chome,Taito-ku, Tokyo 53, 1110053, JP)
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