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Title:
RADIATION SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/180049
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a radiation sensitive composition which has excellent sensitivity and LWR performance. The present invention is a radiation sensitive composition which contains a polymer that has a first structural unit having an acid-cleavable group, a first compound that produces a first acid when irradiated with radiation, and a second compound that produces a second acid when irradiated with radiation, and wherein: the first acid does not substantially dissociate the acid-cleavable group under the conditions of 110°C and one minute; and the second acid dissociates the acid-cleavable group under the conditions of 110°C and one minute. In addition, this radiation sensitive composition satisfies at least one of the condition (1) and the condition (2) described below. (1) The polymer contains a monovalent iodine atom. (2) This radiation sensitive composition additionally contains a third compound which is other than the first compound and the second compound, and which contains a monovalent iodine atom.

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Inventors:
MARUYAMA KEN (JP)
Application Number:
PCT/JP2018/006324
Publication Date:
October 04, 2018
Filing Date:
February 21, 2018
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
G03F7/039; C08F220/18; C08L33/10; G03F7/004; G03F7/20
Domestic Patent References:
WO2005069076A12005-07-28
WO2006035790A12006-04-06
Foreign References:
JP2015172746A2015-10-01
JP2015161823A2015-09-07
JP2003330191A2003-11-19
JP2004020735A2004-01-22
JPH01125907A1989-05-18
JPH08146610A1996-06-07
JP2000298347A2000-10-24
JP2016173513A2016-09-29
JP2009134088A2009-06-18
JPH0612452B21994-02-16
JPS5993448A1984-05-29
JP2006227632A2006-08-31
Other References:
See also references of EP 3605228A4
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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