Title:
RADIATION-SENSITIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/162303
Kind Code:
A1
Abstract:
Disclosed is a radiation-sensitive composition comprising a polymer component (A), a radiation-sensitive acid-generating agent (B), and a solvent component (C) which comprises at least one solvent selected from the group consisting of a solvent represented by general formula (C1-a), a solvent represented by general formula (C1-b) and a solvent represented by general formula (C1-c). In the general formulae, R1 to R5 independently represent an organic group; k represents 1 to 10; l represents 2 to 5; a represents 0 to 12; b represents 0 to 10; and m and n independently represent 2 to 4.
Inventors:
MIYAKE MASAYUKI (JP)
KIMURA TOORU (JP)
NAKAMURA ATSUSHI (JP)
YADA YUJI (JP)
KIMURA TOORU (JP)
NAKAMURA ATSUSHI (JP)
YADA YUJI (JP)
Application Number:
PCT/JP2011/064305
Publication Date:
December 29, 2011
Filing Date:
June 22, 2011
Export Citation:
Assignee:
JSR CORP (JP)
MIYAKE MASAYUKI (JP)
KIMURA TOORU (JP)
NAKAMURA ATSUSHI (JP)
YADA YUJI (JP)
MIYAKE MASAYUKI (JP)
KIMURA TOORU (JP)
NAKAMURA ATSUSHI (JP)
YADA YUJI (JP)
International Classes:
G03F7/004; C08F12/08; G03F7/038; H01L21/027
Foreign References:
| JP2008139827A | 2008-06-19 | |||
| JP2010019966A | 2010-01-28 | |||
| JP2006201532A | 2006-08-03 | |||
| JP2009251216A | 2009-10-29 |
Attorney, Agent or Firm:
WATANABE, Kazuhira (JP)
Ippei Watanabe (JP)
Ippei Watanabe (JP)
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Claims: