RADIATION SENSITIVE COMPOSITION - NISSAN CHEMICAL IND LTD

Title:

RADIATION SENSITIVE COMPOSITION

Document Type and Number:

WIPO Patent Application WO/2016/199762

Kind Code:

A1

Abstract:

[Problem] To provide a radiation sensitive composition which contains, as a base resin, a siloxane polymer having phenoplast crosslinkability, and which has excellent resolution and is capable of forming a pattern having a desired shape with high accuracy. [Solution] A radiation sensitive composition which contains a photoacid generator and, as a silane, a hydrolyzable silane, a hydrolysis product of the hydrolyzable silane or a partial hydrolysis product of the hydrolyzable silane, and wherein the hydrolyzable silane includes compounds represented by formula (1) and formula (2). (In formula (1), R1 represents an organic group represented by formula (1-2) and is bonded to a silicon atom by an Si-C bond or an Si-O bond; R2 represents an organic group; and R3 represents a hydrolyzable group.) (In formula (2), R7 represents an organic group represented by formula (2-1) and is bonded to a silicon atom by an Si-C bond; R8 represents an organic group and is bonded to a silicon atom by an Si-C bond; and R9 represents a hydrolyzable group.) AA Formula

Inventors:

NAKAJIMA MAKOTO (JP)
TAKASE KENJI (JP)
TAKEDA SATOSHI (JP)
SHIBAYAMA WATARU (JP)

Application Number:

PCT/JP2016/066917

Publication Date:

December 15, 2016

Filing Date:

June 07, 2016

Export Citation:

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Assignee:

NISSAN CHEMICAL IND LTD (JP)

International Classes:

G03F7/075; C07F7/18; C08G77/14; C08G77/50; G03F7/038

Domestic Patent References:

WO2005036269A1	2005-04-21
WO2006126406A1	2006-11-30

Foreign References:

JP2013230428A	2013-11-14
JPH08160621A	1996-06-21
JPH04362647A	1992-12-15

Other References: