RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND

Title:

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND

Document Type and Number:

WIPO Patent Application WO/2022/113814

Kind Code:

A1

Abstract:

Provided are: a radiation-sensitive resin composition able to exhibit satisfactory levels of sensitivity, LWR performance and CDU performance; a method for forming a pattern; and an onium salt compound. This radiation-sensitive resin composition contains an onium salt compound represented by formula (1), a resin containing a structural unit having an acid-dissociable group, and a solvent. In the formula (1), R1 is a monovalent hydrocarbon group having 1-20 carbon atoms. R2 and R3 are each independently a monovalent hydrocarbon group having 1-20 carbon atoms, or R2 and R3 combine with each other to form a 3-20-membered ring structure together with the carbon atom to which these are bonded. R4 is a hydrogen atom or a monovalent hydrocarbon group having 1-20 carbon atoms. L1 is a substituted or unsubstituted divalent linking group having 1-40 carbon atoms, or R4 and L1 combine with each other to form a 3-20-membered heterocyclic ring structure together with the nitrogen atom to which these are bonded. L2 is a single bond or a substituted or unsubstituted divalent linking group having 1-40 carbon atoms. Rf1 and Rf2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1-10 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1-10 carbon atoms. In a case where a plurality of Rf1 and Rf2 are present, the plurality of Rf1 and Rf2 may be the same as, or different from, each other. n is an integer between 1 and 4. Z+ is a monovalent radiation-sensitive onium cation.

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Inventors:

NEMOTO RYUICHI (JP)
SAKANO NOZOMI (JP)

Application Number:

PCT/JP2021/042017

Publication Date:

June 02, 2022

Filing Date:

November 16, 2021

Export Citation:

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Assignee:

JSR CORP (JP)

International Classes:

C07C65/10; C07C309/12; C07C309/17; C07C381/12; C07D207/16; C07D211/60; C07D211/62; C07D327/06; C07D333/76; C07D405/12; C07D491/113; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Foreign References:

JP5821543B2

2015-11-24

Attorney, Agent or Firm:

UNIUS PATENT ATTORNEYS OFFICE (JP)

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