Title:
RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ONIUM SALT COMPOUND
Document Type and Number:
WIPO Patent Application WO/2021/235283
Kind Code:
A1
Abstract:
The present invention provides: a radiation sensitive resin composition which is capable of exhibiting sensitivity, CDU performance and LWR performance at sufficient levels; and a method for forming a resist pattern. A radiation sensitive resin composition which contains an onium salt compound, a resin that contains a structural unit having an acid cleavable group, and a solvent, wherein the onium salt compound is at least one compound that is selected from the group consisting of an onium salt compound (1) represented by formula (1) and an onium salt compound (2) represented by formula (2). (In formula (1), R1 represents a hydrogen atom or a monovalent organic group having from 1 to 40 carbon atoms; each of R2 and R3 independently represents a hydrogen atom, a halogen atom, a carboxy group, an amino group or a monovalent organic group having from 1 to 40 carbon atoms, or alternatively, R2 and R3 combine with each other to form a ring structure having from 5 to 8 ring members together with two carbon atoms to which these moieties are bonded; each of X1 and X2 independently represents an oxygen atom or a sulfur atom, provided that the X1 and X2 moieties are not sulfur atoms at the same time; and Z1
+ represents a monovalent radiation sensitive onium cation. In formula (2), R1 represents a hydrogen atom, a halogen atom, or a monovalent organic group having from 1 to 40 carbon atoms; each of R5 and R6 independently represents a hydrogen atom or a monovalent organic group having from 1 to 40 carbon atoms, or alternatively, R5 and R6 combine with each other to form a ring structure having from 3 to 8 ring members together with a nitrogen atom to which these moieties are bonded; and Z2
+ represents a monovalent radiation sensitive onium cation.)
Inventors:
NEMOTO RYUICHI (JP)
Application Number:
PCT/JP2021/017999
Publication Date:
November 25, 2021
Filing Date:
May 12, 2021
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C08F220/10; C07D239/47; C07D239/54; C07D239/553; C07D239/557; C07D239/96; C07D493/04; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| WO2019187591A1 | 2019-10-03 | |||
| WO2006083687A1 | 2006-08-10 |
Foreign References:
| JP2013068776A | 2013-04-18 |
Other References:
MEDEBIELLE, M. ET AL.: "A convenient synthesis or prefluoroalkylated and fluorinated-aryl nitrogen bases by electrochemically induced SRN1 substitution", J. ORG. CHEM, vol. 61, no. 4, 23 August 1995 (1995-08-23), pages 1331 - 1340, XP003012647, [retrieved on 19960000], DOI: 10.1021/jo9515541
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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