RADIATION SENSITIVE RESIN COMPOSITION, PATTERNED FILM, METHOD FOR PRODUCING SAME, PATTERNED SUBSTRATE, CELL CULTURE DEVICE, MICROCHANNEL DEVICE, AND METHOD FOR PRODUCING CLUMPS OF CELLS

Title:

RADIATION SENSITIVE RESIN COMPOSITION, PATTERNED FILM, METHOD FOR PRODUCING SAME, PATTERNED SUBSTRATE, CELL CULTURE DEVICE, MICROCHANNEL DEVICE, AND METHOD FOR PRODUCING CLUMPS OF CELLS

Document Type and Number:

WIPO Patent Application WO/2018/168309

Kind Code:

A1

Abstract:

[Problem] To provide a radiation sensitive resin composition that is capable of suppressing adverse effects of an acid or a base, which is produced during the formation of a pattern, on cells. [Solution] A radiation sensitive resin composition which contains (A) a polymer that has a structural unit (I) represented by formula (1) and (B) at least one radiation sensitive compound that is selected from among radiation sensitive acid generators and radiation sensitive base generators. In formula (1), R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2 and R3 independently represents an alkyl group having 1-5 carbon atoms or an aryl group; each of R4 and R5 independently represents an alkanediyl group having 1-10 carbon atoms; X represents a carboanion (a -COO- group), a sulfo anion (an -SO3 - group) or a phosphate anion; and Q represents an oxygen atom, an ester bond, an amide bond, an arylene group, an alkanediyl group having 1-10 carbon atoms or a combination of these groups.

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Inventors:

KATOU SHOUICHI (JP)
SUDA KIYOSHI (JP)
MIYAJI MASAAKI (JP)
UCHIDA TAROU (JP)
SUGITA HIKARU (JP)
MIURA TAKUYA (JP)
ICHINOHE DAIGO (JP)

Application Number:

PCT/JP2018/005229

Publication Date:

September 20, 2018

Filing Date:

February 15, 2018

Export Citation:

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Assignee:

JSR CORP (JP)

International Classes:

C08F12/26; G03F7/038; C08F20/34; C08F20/60; C09K3/00; C12M3/00; G03F7/20; C08G59/68

Domestic Patent References:

WO2012029731A1	2012-03-08
WO2014058061A1	2014-04-17
WO2017057094A1	2017-04-06

Foreign References:

JPH04258956A	1992-09-14
JP2011152711A	2011-08-11
JP2012072369A	2012-04-12
JP2003334056A	2003-11-25
US20040131973A1	2004-07-08

Attorney, Agent or Firm:

SSINPAT PATENT FIRM (JP)

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