RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

WIPO Patent Application WO/2011/122588

A1

Disclosed are: [A] a polymer containing a structural unit (I) represented by formula (1) below and a structural unit (II) represented by formula (2) below; and [B] a radiation-sensitive resin composition containing a radiation-sensitive acid-generating agent. In formula (1), R1 is a hydrogen atom or a methyl group. R2 is a carbon atom. R3 is a straight-chain or branched alkyl group with 1-4 carbon atoms. Z and R2 form a divalent radical derived from a cycloalkane with less than 10 carbon atoms. However, the total number of carbon atoms in the group comprising Z, R2 and R3, must be no less than 8. In addition, if the number of carbon atoms in the radical comprising Z and R2 is 5 or 6, R3 is a linear or branched alkyl group with 2-4 carbon atoms. In formula (2), R4 is a hydrogen atom or a methyl group. R5 is a carbon atom. R6 is a linear or branched alkyl group with 2-4 carbon atoms. X and R4 form a divalent bridged alicyclic hydrocarbon group with at least 10 carbon atoms.

KASAHARA KAZUKI (JP)
KIMURA TORU (JP)
NAKASHIMA HIROMITSU (JP)
HORI MASAFUMI (JP)
YOSHIDA MASAFUMI (JP)

PCT/JP2011/057713

October 06, 2011

March 28, 2011

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JSR CORP (JP)
KASAHARA KAZUKI (JP)
KIMURA TORU (JP)
NAKASHIMA HIROMITSU (JP)
HORI MASAFUMI (JP)
YOSHIDA MASAFUMI (JP)

G03F7/039; C08F220/18; H01L21/027

WO2010007993A1	2010-01-21
WO2010029965A1	2010-03-18

JP2010039476A	2010-02-18
JP2010033031A	2010-02-12
JP2009080161A	2009-04-16
JP2009025723A	2009-02-05
JP2005054070A	2005-03-03
JP2011006400A	2011-01-13
JP2010191014A	2010-09-02

AMANO KAZUNORI (JP)
Kazuki Amano (JP)

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